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POLYMER OR RESIST PATTERN, AND METAL FILM PATTERN, METAL PATTERN, AND PLASTIC MOLD USING THEREOF, AND METHODS OF FORMING THE SAMES
POLYMER OR RESIST PATTERN, AND METAL FILM PATTERN, METAL PATTERN, AND PLASTIC MOLD USING THEREOF, AND METHODS OF FORMING THE SAMES
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机译:聚合物或抗蚀剂图案,以及使用其的金属膜图案,金属图案和塑料模具,以及形成模腔的方法
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摘要
Polymer or resist patterns and a metal thin pattern using the same, a metal pattern, a plastic mold and forming methods thereof are provided to obtain an aiming three-dimensional structure from the polymer or resist patterns by using a light controlling layer. Polymer or resist patterns(310) are formed on a substrate(300). A predetermined portion for being exposed is determined on the resultant structure by using a photomask. A light controlling layer(340) is arranged on a light path. The direction and transmissivity of light are controlled by adjusting properly the light controlling layer. The light controlling layer is capable of being arranged on the photomask or under the photomask.
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