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Mirror reflecting in the EUV spectral range

机译:在EUV光谱范围内的镜面反射

摘要

Mirror for the EUV spectral region comprises a layer arrangement having a number of partial layer systems (1, 2, 3) applied on a substrate (7). The partial layer systems have a sequence of individual layers of different materials forming periods (4). The number of periods and the thickness of the periods of the partial systems decreases from the substrate to the surface (8). Preferred Features: Three partial systems with periods of two individual layers of different materials are arranged on the substrate. The number of periods of each partial system is selected so that all partial systems have the same reflectivity of the mirror. The individual layers are made from molybdenum and silicon.
机译:用于EUV光谱区域的反射镜包括层布置,该层布置具有施加在衬底(7)上的多个部分层系统(1、2、3)。部分层系统具有一系列不同材料的单独层序列,形成周期(4)。从基板到表面(8),部分系统的周期数和周期厚度减小。优选特征:在基材上布置三个部分系统,其周期为两个不同材料的独立层。选择每个部分系统的周期数,以使所有部分系统具有与反射镜相同的反射率。各个层由钼和硅制成。

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