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Flash - memory cell, arrangement of the flash - memory cells and method for the production of the flash - memory cells

机译:闪速存储器单元,闪速存储器单元的布置以及制造闪速存储器单元的方法

摘要

Memory cells, formed as trench transistors, having a respective floating gate electrode and a control gate electrode at a trench wall above a channel region between doped regions for source and drain are provided with a gate electrode arranged in a further trench, via which gate electrode the channel region present in a semiconductor ridge between the trenches can additionally be driven.
机译:形成为沟槽晶体管的存储单元在位于用于源极和漏极的掺杂区域之间的沟道区域上方的沟槽壁上方的沟槽壁处具有相应的浮置栅电极和控制栅电极,该存储单元具有布置在另一沟槽中的栅电极,通过该栅电极另外,可以驱动存在于沟槽之间的半导体脊中的沟道区域。

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