首页>
外国专利>
Deposition of single layers, on a flat or structured substrate, uses a limiter to stop the deposition automatically when the layer is closed
Deposition of single layers, on a flat or structured substrate, uses a limiter to stop the deposition automatically when the layer is closed
展开▼
机译:在平坦或结构化的基板上进行单层沉积时,使用限制器可在层关闭时自动停止沉积
展开▼
页面导航
摘要
著录项
相似文献
摘要
The process to deposit at least one layer on to a substrate, containing at least one initial component, uses a process chamber where there is a cyclic and alternating action between two start materials where the first start material contains the first component. The start material is a gas, fed into the process chamber so that in each cycle only one layer is deposited of the first component. A limiter is introduced into the process chamber together with the first start material, or at an offset time, so that the deposition of the first component on the substrate ends automatically when the first layer is closed. The growth of a second layer is possible when the cycle ends. The layers are deposited on a substrate with a flat or structured surface using components of metal, oxygen, nitrogen or carbon. The start material contains ruthenium, and the limiter is octane or iso octane or a hydrocarbon.
展开▼