首页> 外国专利> Electrostatic discharge protection method for semiconductor circuit, involves arranging contact hole and metal layer exhibiting high heat conductivity compared to materials of circuit, in electrostatic discharge protection device

Electrostatic discharge protection method for semiconductor circuit, involves arranging contact hole and metal layer exhibiting high heat conductivity compared to materials of circuit, in electrostatic discharge protection device

机译:用于半导体电路的静电放电保护方法,涉及在静电放电保护装置中布置与电路材料相比具有高导热性的接触孔和金属层

摘要

The method involves discharging an over voltage adjoining a semiconductor circuit, over a discharge path by an electrostatic discharge (ESD) protection device (1). A contact hole (8) and a metal layer (9) are arranged in the device for heat conduction, and have a heat conductivity higher than the average heat conductivity of the materials of the circuit. The hole and the metal layer are arranged close to hotspots of the device. An independent claim is also included for a semiconductor circuit comprising an ESD protection device.
机译:该方法包括通过静电放电(ESD)保护装置(1)在放电路径上放电与半导体电路相邻的过电压。接触孔(8)和金属层(9)布置在用于热传导的装置中,并且具有高于电路材料的平均热导率的热导率。孔和金属层被布置为靠近装置的热点。对于包括ESD保护装置的半导体电路也包括独立权利要求。

著录项

  • 公开/公告号DE102005013478A1

    专利类型

  • 公开/公告日2006-10-05

    原文格式PDF

  • 申请/专利权人 INFINEON TECHNOLOGIES AG;

    申请/专利号DE20051013478

  • 发明设计人 STREIBL MARTIN;ESMARK KAI;

    申请日2005-03-23

  • 分类号H01L23/60;H01L23/36;

  • 国家 DE

  • 入库时间 2022-08-21 21:20:20

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