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Magnetron-driven atomization and sputtering coating process predetermines target atomization condition and modifies magnet array rotation
Magnetron-driven atomization and sputtering coating process predetermines target atomization condition and modifies magnet array rotation
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机译:磁控管驱动的雾化和溅射镀膜工艺可确定目标雾化条件并改变磁体阵列的旋转
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摘要
In a magnetron-driven atomization and sputtering coating process, the coating particles are directed at the substrate surface by an array of rotating magnets. In the process, the atomization condition of the target is first determined, and the magnetic array speed of rotation regulated accordingly. The atomization condition is determined in accordance with the residual service life.
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