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LINEWIDTH MEASUREMENT REGULATION METHOD, AND SCANNING ELECTRON MICROSCOPE

机译:线宽测量调节方法和扫描电子显微镜

摘要

PROBLEM TO BE SOLVED: To provide a linewidth measurement regulation method and a scanning electron microscope capable of preventing a measured result from being fluctuated even when changing a magnification, a scanning direction and a measuring instrument.;SOLUTION: This linewidth measurement regulation method includes regulation for the second electron beam intensity distribution to make the first electron beam intensity distribution of an electron beam scanned in the first magnification equal to the second electron beam intensity distribution of an electron beam scanned in the second magnification. The second electron beam intensity distribution may be regulated by increasing or decreasing the second irradiation distance when preparing the electron beam intensity distribution.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:提供一种线宽测量调整方法和扫描电子显微镜,即使在改变放大倍率,扫描方向和测量仪器时,也能够防止测量结果波动。使第二电子束强度分布使在第一倍率下扫描的电子束的第一电子束强度分布等于在第二倍率下扫描的电子束的第二电子束强度分布。在准备电子束强度分布时,可以通过增加或减小第二照射距离来调节第二电子束强度分布。;版权所有:(C)2008,JPO&INPIT

著录项

  • 公开/公告号JP2007263566A

    专利类型

  • 公开/公告日2007-10-11

    原文格式PDF

  • 申请/专利权人 ADVANTEST CORP;

    申请/专利号JP20060084868

  • 发明设计人 KURIHARA MASAYUKI;MATSUMOTO JUN;

    申请日2006-03-27

  • 分类号G01B15/00;G01N23/225;H01L21/027;H01J37/28;H01J37/04;

  • 国家 JP

  • 入库时间 2022-08-21 21:16:23

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