EXPOSURE DEVICE, MASK WASHING APPARATUS, MASK WASHING METHOD, AND MASK STORAGE METHOD

摘要

PROBLEM TO BE SOLVED: To prevent the lowering of the product yield by facilitating pattern processing with high resolution.;SOLUTION: To a mask M which is supported by a mask support pedestal 121 in illumination to the mask M, a gas atomizer 131 atomizes an inert gas g, thereby washing the mask M with a mask washer 3.;COPYRIGHT: (C)2007,JPO&INPIT