METHOD OF PRODUCING MEMBER FOR LITHOGRAPHY, METHOD OF PRODUCING REFLECTION TYPE MASK BLANK, METHOD OF PRODUCING MASK BLANK, METHOD OF PRODUCING REFLECTION TYPE MASK, METHOD OF PRODUCING MASK AND WASHING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a method of producing a member for lithography including a cleaning treatment suitable for a member for lithography requiring high-level defect quality.;SOLUTION: A member for lithography is held horizontally in a cleaning liquid contained in a cleaning tank so that the to-be-cleaned surface of the member for lithography is horizontal, and a shear flow is produced between the to-be-cleaned surface and a roller by rotating the roller arranged in the proximity of the to-be-cleaned surface so as to face the to-be-cleaned surface, in order to remove foreign matter on the surface of the member for lithography. During a cleaning treatment, the treatment is carried out while moving the member for lithography and the roller relatively in the horizontal direction.;COPYRIGHT: (C)2014,JPO&INPIT