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Mask holding method, mask and mask chuck, exposure apparatus using the mask and the mask chuck, and device production method using the exposure apparatus
Mask holding method, mask and mask chuck, exposure apparatus using the mask and the mask chuck, and device production method using the exposure apparatus
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机译:掩模保持方法,掩模和掩模卡盘,使用该掩模和掩模卡盘的曝光装置以及使用该曝光装置的器件制造方法
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摘要
V-shaped linear groove portions are formed at regular intervals and at three positions (with 120° pitches) on a periphery, concentric with a ring-shaped support frame, of an X-ray mask to extend in the radial direction. On the other hand, corresponding mounts, as projecting portions, each having a spherical leading end are disposed at three positions on a mask chuck. The mask is held on the mask chuck at the three positions by engaging the corresponding V-shaped linear groove portions and the projecting portions.
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