ELECTRON BEAM DOSE CONTROL FOR SCANNING ELECTRON MICROSCOPY AND CRITICAL DIMENSION MEASUREMENT EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To provide a system and method for controlling electron exposure on image specimens by adjusting a raster scan area in-between scan frame cycles.;SOLUTION: A small, zoomed-in, scan area and the surrounding area are flooded with positive charge for a number of frame cycles between scan frames to reduce the voltage differential between the scan area and surrounding area, thereby reducing the positive charge build-up which tends to obscure small features in scanned images. The peak current into a pixel element on the specimen is reduced by scanning the beam with a line period that is very short compared to regular video. Frames of image data may further be acquired non-sequentially, in arbitrarily programmable patterns. Alternatively, an inert gas can be injected into the scanning electron microscope at the point where the electron beam impinges the specimen to neutralize a charge build-up on the specimen by the ionization of the inert gas by the electron beam.;COPYRIGHT: (C)2007,JPO&INPIT