ACID-FREE WASHING PROCESS FOR SUBSTRATE, PARTICULARLY MASK AND MASK BLANK

摘要

PROBLEM TO BE SOLVED: To provide a process useful for mask blank washing, which can avoid the use of an acid, particularly sulfuric acid, and utilizes a nonionic washing agent suitable for this process.;SOLUTION: This process for substrate washing comprises the followings steps: (a) UV-treatment step, (b) full jet washing step, (c) megasonic washing step, (d) DI water rinse step, and, if necessary, substrate drying step.;COPYRIGHT: (C)2007,JPO&INPIT