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Photomask and Next-Generation Lithography Mask Technology XII pt.1

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1.Validation of Nu-Flare E-beam Emulation software in a Simulation Environment

机译：在仿真环境中验证Nu-Flare电子束仿真软件
- 作者：Daniel Ritter;Peter Brooker;John Lewellen;Young-Mog Ham;Patrick Martin;R Cottle
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- PEC;
- RET;
- mask making;
- E-Beam;
- simulation;
2.The unified mask data format based on OASIS for VSB EB writers

机译：VSB EB编写器基于OASIS的统一掩码数据格式
- 作者：Toshio Suzuki;Junji Hirumi;Yutaka Hojyo;Yuichi Kawase;Shinji Sakamoto;Koki Kuriyama;Syogo Narukawa;Morihisa Hoga
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- GDSII;
- MDP;
- EB;
- VSB;
- OASIS;
- EDA;
- RET;
3.Simulation of resist heating effect with E-beam lithography using Distributed Processing (DP)

机译：使用分布式处理（DP）的电子束光刻模拟抗蚀剂加热效果
- 作者：Won-Tai Ki;Byung-Sup Ahn;Ji-Soong Park;Seung-Woon Choi;Sang-Back Ma;Woo-Sung Han
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- photomask;
- E-beam lithography;
- resist heating effect;
- distributed processing (DP);
4.RET Masks for the Final Frontier of Optical Lithography

机译：RET掩模用于光学光刻的最终领域
- 作者：J. Fung Chen;Douglas van den Broeke;Stephen Hsu;Michael CW Hsu;Tom Laidig;Xuelong Shi;Ting Chen;Robert J. Socha;Uwe Hollerbach;Kurt E. Wampler;Jungchul Park;Sangbong Park;Keith Gronlund
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- resolution enhancement technology;
- RET;
- scattering bars;
- SB;
- model-based SB;
- chromeless phase lithography;
- CPL;
- Double Dipole Lithography;
- DDL;
- low k_1 lithography;
- interference mapping lithography;
- IML;
5.Second Level Exposure for Phase Shift Mask Applications using an SLM-based DUV Mask Writer

机译：使用基于SLM的DUV Mask Writer进行相移掩模应用的第二级曝光
- 作者：Mahesh Chramouli;Bob Olshausen;Yulia Korobko;Sven Henrichs;Ping Qu;Jian Ma;Bruce Auches;Damon Cole;Thomas Oestroem;Angela Beyerl;Robert Eklund;Raoul Zerne;Peter Goeransson;Magnus Persson;Tom Newman
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- PSM;
- Alt-PSM;
- DUV;
- SLM;
- mask writer;
6.Status of EUVL mask development in Europe

机译：EUVL口罩在欧洲的发展状况
- 作者：Jan Hendrik Peters
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- EUV;
- mask substrate;
- mask blank;
- mask patterning;
- CD metrology;
- inspection;
- handling;
- supply chain;
7.Quartz etch process for Alternating Aperture Phase Shift masks (alt-APSM)

机译：交替孔径相移掩模（alt-APSM）的石英蚀刻工艺
- 作者：Sunil Srinivasan;Russ Westerman;Jason Plumhoff;Dave Johnson;Chris Constantine
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- phase shift masks;
- phase uniformity;
8.Implementing chemically amplified resist to 10kV raster e-beam process in photomask manufacturing

机译：在光掩模制造中对10kV光栅电子束工艺实施化学放大抗蚀剂
- 作者：Sook-Kyeong Kim;Byung-Gook Kim;Seong-Yong Moon;Sung-Woon Choi;Woo-Sung Han
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- CAR;
- ZEP7000;
- 10keV raster e-beam system;
9.New EUVL ML Capping Design for ML Blank Multiple Reuses

机译：针对ML空白多次重复使用的新EUVL ML封盖设计
- 作者：Pei-yang Yan;Eberhard Spiller
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- extreme ultraviolet lithography (EUVL);
- EUVL mask blank;
- Ru capping layer;
- ML capping layer;
10.Local IP evaluations of EPL reticle with 4 mm-sq Si membranes

机译：具有4 mm-sq硅膜的EPL光罩的局部IP评估
- 作者：Kaoru Koike;Hiroshi Sakaue;Hiroshi Arimoto;Tukasa Yamazaki;Hiroshi Sugimura;Takashi Susa;Kojiro Itoh;Akira Tamura
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- electron beam;
- EPL;
- stencil mask;
- image placement;
- large sub-field;
- pattern distortion;
11.New slit scan developer system for advanced 45-nm mask making

机译：新的狭缝扫描显影系统可用于先进的45 nm掩模制造
- 作者：Sharon Wang;Shinsuke Miyazaki;Makoto Kozuma
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
12.Novel acid-free cleaning process for mask blanks

机译：面膜毛坯的新型无酸清洁工艺
- 作者：Harald Koster;Karsten Branz;Uwe Dietze;Peter Dress;Guenter Hess
- 会议名称：《》 | 2005年
- acid-free cleaning;
- mask blanks;
- Haze;
- PSM;
13.Patterning of Ta/SiO_2 High Transmission EAPSM Material for 193nm Technology

机译：用于193nm技术的Ta / SiO_2高透射EAPSM材料的图案化
- 作者：Corinna Koepernik;H.W. Becker;J. Butschke;U. Buttgereit;M. Irmscher;L. Nedelmann;F. Schmidt;S. Teuber
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- EAPSM;
- phase shift mask;
- high transmission;
- Ta/SiO_2;
- dry etching;
- 193nm lithography;
14.Performance results from the Zeiss/NaWoTec MeRit MG electron beam mask repair tool

机译：Zeiss / NaWoTec MeRit MG电子束掩模修复工具的性能结果
- 作者：Klaus Edinger;Volker Boegli;Wolfgang Degel
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- mask repair;
- photomask;
- reticle;
- electron beam;
- binary mask;
- PSM;
- phase shift mask;
- electron beam induced reaction;
15.Print Characterization of Photomasks from Next-Generation Deep-Ultra-Violet Laser Pattern Generator

机译：下一代深紫外激光图案发生器产生的光掩模的印刷特性
- 作者：Curt Jackson;Robert Kiefer;Peter Buck;David Mellenthin;John Manfredo;Vishal Garg;Jason Hickethier;Sarah Cohen;Cris Morgante;Paul C. Allen;Eric Christenson;Michael White
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- CD uniformity;
- DUV;
- mask pattern generation system;
- multi-beam;
- OPC;
- pattern fidelity;
16.Resist baking conversion from wafers to mask-substrates

机译：抵抗从晶圆到掩模基板的烘烤转换
- 作者：Hideo Kobayashi
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
17.Feasibility Study of Double Exposure Lithography for 65nm 45nm node

机译：65nm和45nm节点双曝光光刻技术的可行性研究
- 作者：Stephen Hsu;Douglas Van Den Broeke;J. Fung Chen;Jungchul Park;Michael C W Hsu
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- double exposure lithography;
- DEL;
- double dipole lithography;
- DDL;
- off-axis illumination;
- OAI;
- scattering bars;
- SB;
- shielding;
- RET;
- model based lay'out conversion;
- polarization;
18.Impact of the absorber thickness variation on the imaging performance of ArF immersion lithography

机译：吸收体厚度变化对ArF浸没式光刻成像性能的影响
- 作者：Masaki Yoshizawa;Vicky Philipsen;Leonardus H. A. Leunissen
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- mask topography;
- rigorous 3D mask simulation;
- 193 nm lithography;
- absorber thickness;
- polarization;
19.Evaluation of quartz dry etching profile for the PSM lithography performance

机译：石英干法刻蚀轮廓对PSM光刻性能的评估
- 作者：Toru Komizo;Satoru Nemoto;Yosuke Kojima;Takashi Ohshima;Takashi Yoshii;Toshio Konishi;Kazuaki Chiba;Yasutaka Kikuchi;Masao Otaki;Yoshimitsu Okuda
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- quartz etching profile;
- phase shift mask;
- ArF lithography;
- 3D-mask simulation;
- AIMS;
20.Evaluation of the new-type ESPACER adopted for its removal after Post-Exposure Bake Process

机译：评估在暴露后烘烤过程中采用的新型ESPACER的去除方法
- 作者：Yoshihiro Saida;Takashi Okubo;Jun Sasaki;Toshio Konishi;Motohiko Morita
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- ESPACER;
- FEP;
- resist thickness reduction;
- sheet resistance;
- alternating phase shift mask;
- second level e-beam exposure;
- profile;
21.Chip Level Lithography Verification System with Artificial Neural Networks

机译：人工神经网络芯片级光刻验证系统
- 作者：Jae-pil Shin;Jin-sook Choi;Dae-hyun Jung;Jee-hyong Lee;Moon-hyun Yoo;Jeong-taek Kong
- 会议名称：《》 | 2005年
- lithography verification;
- hierarchy restructuring;
- artificial neural networks;
22.Correction of long-range effects applied to the 65-nm node

机译：校正应用于65 nm节点的远程效应
- 作者：Jerome Belledent;James Word;Yorick Trouiller;Christophe Couderc;Corinne Miramond;Olivier Toublan;Jean-Damien Chapon;Stanislas Baron;Amine Borjon;Franck Foussadier;Christian Gardin;Kevin Lucas;Kyle Patterson;Yves Rody;Frank Sundermann
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- stray light;
- density;
- OPC;
- etch;
- long range effects;
23.Dual Layer Patterning failures in complex RET processes using ORC tools and pre or post-Optical Proximity Correction strategy

机译：使用ORC工具和前后光学接近度校正策略的复杂RET过程中的双层图案故障
- 作者：C. Couderc;J. Belledent;A. Borjon;Y. Trouiller;F. Sundermann;K Lucas;JC Urbani;F. Foussadier;Y. Rody;K. Patterson;S. Baron
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- optical proximity correction;
- optical rule checking;
- multi layer ORC;
- multi layer interaction domains;
24.Evaluation of E-Beam Sensitive CARs for Advanced Mask Making

机译：先进口罩制造的电子束敏感汽车评估
- 作者：Axel Feicke;Mathias Irmscher;Anatol Schwersenz;Martin Tschinkl
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- positive-tone;
- negative-tone;
- chemically amplified resist;
- e-beam;
- mask process;
25.EUV Mask Image Placement Management in Writing, Registration, and Exposure Tools

机译：编写，注册和曝光工具中的EUV蒙版图像放置管理
- 作者：Eric Gotte;Uwe Dersch;Christian Holfeld;Uwe Mickan;Holger Seitz;Thomas Leutbecher;Guenter Hess
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- EUV;
- image placement;
- chucking;
- photomask;
- stressed layer;
26.Cryogenic aerosol cleaning of photomasks

机译：低温气溶胶清洁光罩
- 作者：S. Banerjee;CC Lin;S. Su;H. F. Chung;W. Brt;K. Tang
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- CO_2 aerosol;
- post-repair cleaning;
- photomask;
- particle removal;
- haze;
- phase and transmission change;
27.AUV5500: Advanced in-situ dry cleaning and metrology process for next generation lithography

机译：AUV5500：先进的原位干洗和计量工艺，适用于下一代光刻
- 作者：Christian Chovino;Stefan Helbig;Peter Dress
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- dry cleaning;
- NGL;
- photomask;
- contamination;
28.Application of a wafer development process to mask making

机译：晶圆开发工艺在掩模制造中的应用
- 作者：Gaston Lee;Celine Berger;Christian Buergel;Axel Feicke;Rusty Cantrell;Martin Tschinkl
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- photomask;
- LD nozzle;
- SH nozzle;
- develop;
- puddle process;
- CD uniformity;
- local loading;
- E-beam CAR;
29.An Automated Mask Defect Analysis System for Increasing Mask Shop Productivity

机译：自动化的口罩缺陷分析系统，可提高口罩车间的生产率
- 作者：Peter Fiekowsky;Christopher Lewis;y McDonald
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
30.An Investigation of a New Generation of Progressive Mask Defects on the Pattern Side of Advanced Photomasks

机译：先进光掩模图案一侧的新一代渐进掩模缺陷的研究
- 作者：Kaustuve Bhattacharyya;Mark Eickhoff;Brian Grenon;Mark Ma;Sylvia Pas
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- reticle defect;
- mask inspection;
- crystal growth;
- on chrome;
- on halftone;
- STARlight™;
31.A study for the control of chemical residuals on photomasks by using a thermal treatment for 65-nm node

机译：通过对65 nm节点进行热处理来控制光掩模上化学残留物的研究
- 作者：Han-Byul Kang;Jong-Min Kim;Yong-Dae Kim;Hyun-Joon Cho;Sang-Soo Choi
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- haze;
- ammonium sulfate;
- thermal treatment;
32.A new method for correcting proximity and fogging effects by using the EID model of variable shaped beam for 65-nm node

机译：利用65nm节点的异形光束EID模型校正邻近和雾化效果的新方法
- 作者：Eui-Sang Park;Hyun-Joon Cho;Jin-Min Kim;Sang-Soo Choi
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
33.A Study of Storage Life Extension for High Performance Chemically Amplified Resist Coated Blank

机译：高性能化学放大抗蚀涂层毛坯的保质期研究
- 作者：Sin-Ju Yang;Sung-Min Seo;Sang-Hoon Ko;Han-Sun Cha;Geung-Won Kang;Kee-Soo Nam;Woong-Won Seo;Woo-Kyun Jung;Hyun-Kyoon Cho;Jin-Min Kim;Sang-Soo Choi
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- blank;
- photomask;
- CAR;
- storage life;
- AMC;
- DTC;
- packing materials;
34.Verification of the modified model of drying process of a polymer liquid film on a flat substrate by experiment

机译：通过实验验证聚合物液体膜在平坦基底上干燥过程的改进模型
- 作者：Hiroyuki Kagami
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
35.Study of Stress Birefringence for 193-nm Immersion Photomasks

机译：193 nm浸入式光掩模的应力双折射研究
- 作者：Eric Cotte;Michael Selle;Karsten Bubke;Silvio Teuber
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- birefringence;
- stress;
- photomask;
- Jones calculus;
36.Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications

机译：用于65nm半间距交替孔径相移应用的贯穿间距特性和可印刷性
- 作者：Vicky Philipsen;Leonardus Leunissen;Rudi De Ruyter;Rik Jonckheere;Patrick Martin;Photronics;Clare Wakefield;Stephen Johnson;Mike Cangemi;Alex Buxbaum;Troy Morrison
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
37.Sub 100-nm defect classification and analysis on extreme ultraviolet (EUV) mask blanks and substrates

机译：极紫外（EUV）掩模坯料和基板的100 nm以下缺陷分类和分析
- 作者：Emily Y. Shu
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- defect analysis;
- defect composition;
- defect review;
- defect characterization;
- defect root cause;
- EUV mask;
- EUV blank;
- auger spectroscopy;
- SEM;
- AFM;
- EDX;
38.Recent progress in the fabrication of low defect density mask blanks

机译：低缺陷密度掩膜毛坯的制造最新进展
- 作者：y Ma;Patrick Kearney;Dave Krick;Rajul Rive;Ira Reiss;Paul Mirkarimi;Eberhard Spiller
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- multilayer deposition;
- ion beam deposition;
- reflectivity;
39.Simultaneous Source Mask Optimization (SMO)

机译：同步源掩模优化（SMO）
- 作者：Robert Socha;Xuelong Shi;David LeHoty
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- source;
- mask;
- illumination;
- optimization;
- SMO;
- chromeless phase lithography;
- CPL;
- IML;
40.Requirements for mask technology from the view point of SOC and FLASH memory trends

机译：从SOC和FLASH存储器趋势的角度出发，对掩模技术的要求
- 作者：Akira Imai;Nobuyuki Yoshioka;Tetsuro Hanawa;Koichiro Narimatsu;Kunihiko Hosono;Kazuyuki Suko
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
41.Implementation of an efficient defect classification methodology for advanced reticle inspection

机译：实施有效的缺陷分类方法以进行高级掩模版检查
- 作者：Paul Yu;Vincent Hsu;Ellison Chen;Rick Lai;Kong Son;Weimin Ma;Peter Chang;Jackie Chen
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- TeraScan;
- ReviewSmart;
- reticle inspection;
- defect review;
42.Improving OPC Quality Via Interactions Within the Design-to-Manufacturing Flow

机译：通过设计到制造流程中的交互作用来提高OPC质量
- 作者：P. Gupta;A.B. Kahng;C.-H. Park
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
43.Investigation of Pellicle Influence on Reticle Flatness

机译：薄膜对光罩平整度的影响研究
- 作者：Christopher Lee;Kenneth Racette;Monica Barrett
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- photomask;
- reticle;
- pellicle;
- flatness;
- mask blank;
- depth of focus;
44.Modeling of Mask Thermal Distortion and Its Dependency on Pattern Density

机译：掩模热变形的建模及其与图案密度的关系
- 作者：Qiaolin Zhang;Kameshwar Poolla;Costas J. Spanos
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- mask thermal distortion;
- pattern density;
- pattern layout;
- pattern density distribution;
- finite element model;
- monte carlo simulation;
45.Monitoring System of CD error Analysis for 90-nm node Mask Manufacturing

机译：90 nm节点掩模制造CD错误分析监控系统
- 作者：Sang-Yong Yu;Soon-Ho Kim;Byung-Cheol Cha;Yong-Hoon Kim;Seung-Woon Choi;Hee-Sun Yoon;Woo-Sung Han
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- mask uniformity;
- global CD error;
- local CD error;
46.Multi-layer and Multi-product Masks: Cost Reduction Methodology

机译：多层和多产品掩模：降低成本的方法
- 作者：Artur Balasinski
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- mask sharing;
- mask shuttle;
- stepper throughput;
- mask cost;
- business model;
47.Photomask process development for next generation lithography

机译：下一代光刻的光掩模工艺开发
- 作者：Shiho Sasaki;Kimio Itoh;Akiko Fujii;Nobuhito Toyama;Hiroshi Mohri;Naoya Hayashi
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- imprint;
- 1X masks;
- higher resolution;
- mold;
48.Photomask lifetime issues in ArF lithography

机译：ArF光刻中的光掩模寿命问题
- 作者：Florence Eschbach;Peter Coon;Barbara Greenebaum;Anurag Mittal;Peter Sanchez;Daniel Tanzil;Grace Ng;Henry Yun;Archita Sengupta
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- ArF lithography;
- photoinduced defects;
- pellicle lifetime;
49.Prediction of etch profile and CD variation due to dry etch using the TRAVIT software tool

机译：使用TRAVIT软件工具预测由于干法蚀刻引起的蚀刻轮廓和CD变化
- 作者：S. Babin;K. Bay;S. Okulovsky
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- maskmaking;
- dry etch;
- etch profile;
- CD variation;
- simulation;
50.Exploring the fundamental limit of CD control: shot noise and CD uniformity improvement through resist thickness

机译：探索CD控制的基本极限：通过抗蚀剂厚度改善散粒噪声和CD均匀性
- 作者：Ming L. Yu;Allan Sagle;Benny Buller
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- shot noise;
- CD uniformity;
- resist;
- acid diffusion;
- beam blur;
51.Exploring new high speed, mask aware RET verification flows

机译：探索新的高速，可识别掩模的RET验证流程
- 作者：Patrick Martin;Christopher J. Progler;Young-mog Ham;Bryan Kasprowicz;Rick Gray;James N. Wiley;Zongchang Yu;Jun Ye
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- optical lithography;
- ET;
- OPC;
- simulation;
- verification;
- image based;
- aerial image;
- metrology;
- AIMS;
- photomask;
52.High Performance FEP-171 Resist Process in Combination with NTAR7 and NTAR5 Chrome

机译：结合了NTAR7和NTAR5铬的高性能FEP-171抵抗工艺
- 作者：Kezhao Xing;Johan Karlsson;Adisa Paulson;Charles Bjoernberg;Axel Lundvall;Peter Hoegfeldt;Jukka Vedenpaeae;Robin Goodoree;Mans Bjuggren
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- photomask;
- NTAR7;
- NTAR5;
- FEP-171;
- development;
53.Determination of mask induced polarization effects on AltPSM mask structures

机译：确定掩模引起的极化对AltPSM掩模结构的影响
- 作者：Ingo Hoellein;Silvio Teuber;Karsten Bubke
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- AltPSM;
- polarization;
- high NA;
- immersion;
- 50 nm lithography;
54.Character-Build Standard-Cell Layout Technique for High-Throughput Character-Projection EB lithography

机译：高通量字符投影EB光刻的字符构建标准单元布局技术
- 作者：Takeshi Fujino;Yoshihiko Kajiya;Masaya Yoshikawa
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- EB direct write;
- EB lithography;
- character projection;
- cell projection;
- block exposure;
- standard cell. mask layout;
55.An efficient Resolution Enhancement Technique flow for 65nm Logic Poly layer

机译：用于65nm逻辑多晶硅层的高效分辨率增强技术流程
- 作者：Paul.J.M. van Adrichem;Manoj Chacko;Bryan S. Kasprowicz
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- resolution enhancement;
- alternating phase shifting mask;
- OPC;
- cost;
- 65nm;
56.Advances with the new AIMS™ fab 193 2nd generation: A system for the 65 nm node including immersion

机译：新的第二代AIMS™fab 193的进步：用于65 nm节点的系统，包括浸没
- 作者：Axel M. Zibold;E. Poortinga;H.v. Doornmalen;R. Schmid;T. Scheruebl;W. Hamisch
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- AIMS;
- printability;
- photomask;
- immersion;
- numerical aperture;
- polarisation;
- PSM;
- OPC;
- design for manufacture;
- automation;
57.65nm mask CD qualification on critical features through simulation based Lithography Verification

机译：通过基于模拟的光刻验证对关键特征进行65nm掩模CD鉴定
- 作者：Paul.J.M. van Adrichem;John Valadez;David Ziger;Dave Gerold
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- SiVL;
- metrology automation;
- mask qualification;
- CD;
- MEEf;
58.A Novel Robust Optimization Method of Exposure and Mask Conditions for Beyond 65 nm-node Lithography

机译：超越65 nm节点光刻的曝光和掩模条件的鲁棒优化方法
- 作者：Koichi Takeuchi;Kazuya Iwase;Ken Ozawa;Fumikatsu Uesawa
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- optimization method;
- lithography simulation;
- alt-PSM;
- mask structures;
- design of experiments;
59.Mask Modeling in the Low k_1 and Ultrahigh NA Regime: Phase and Polarization Effects

机译：低k_1和超高NA条件下的掩模建模：相位和偏振效应
- 作者：Andreas Erdmann
- 会议名称：《Photomask and Next-Generation Lithography Mask Technology XII pt.1》 | 2005年
- lithography simulation;
- mask topography;
- mask polarization;