首页> 外国专利> HOLDING TABLE, PROCESSING DEVICE OF HELD ARTICLE AND PROCESSING DEVICE OF SEMICONDUCTOR WAFER

HOLDING TABLE, PROCESSING DEVICE OF HELD ARTICLE AND PROCESSING DEVICE OF SEMICONDUCTOR WAFER

机译:保持台,焊接工件的加工装置和半导体晶片的加工装置

摘要

PROBLEM TO BE SOLVED: To provide a holding table constituted simple and capable of holding a held article regardless of size and shape, restraining electric power for working, etc. and reducing cost, a processing device of the held article and a processing device of a semiconductor wafer.;SOLUTION: This holding table is furnished with a base 40 provided on a processing table 3 of a back grinding device 1, a dent hole 41 formed recessed in a flat surface circular shape on a surface of the base 40, a deformable holding layer 43 to closely hold the semiconductor wafer W free to connect and disconnect by covering the dent hole 41 and an exhaust passage 44 to exhaust air in the dent hole 41 covered with the holding layer 43 outside in accordance with driving of a vacuum pump 45. It is possible to continuously adhere the semiconductor wafer W of a small bore diameter as the air does not leak even when the semiconductor wafer of less than the set size, etc. is used as it is by setting a size of the holding layer 43 so as to correspond with the size of the semiconductor wafer W.;COPYRIGHT: (C)2007,JPO&INPIT
机译:解决的问题:提供一种构造简单并且能够不管尺寸和形状而保持被保持物,抑制工作电力等并降低成本的保持台,被保持物的处理装置和处理装置。半导体解决方案:解决方案:此固定台配备有基座40,该基座40设置在背面研磨装置1的处理台3上,凹入孔41形成为在基座40的表面上以平面圆形凹入,并且可变形通过覆盖凹坑孔41和排气通道44以紧密地保持半导体晶片W自由地连接和断开的保持层43,以根据真空泵45的驱动将被保持层43覆盖的凹坑孔41中的空气排出到外部。通过设定尺寸等,即使直接使用小于设定尺寸的半导体晶片,也不会漏气,因此能够连续地粘接小口径的半导体晶片W。保持层43的厚度与半导体晶片W的尺寸相对应。;版权:(C)2007,JPO&INPIT

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号