首页> 外国专利> PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL USING FLUORINE COMPOUND HAVING SPECIFIC CHEMICAL STRUCTURE

PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL USING FLUORINE COMPOUND HAVING SPECIFIC CHEMICAL STRUCTURE

机译:具有特定化学结构的氟化合物光敏石版印刷板材料

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive lithographic printing plate material which improves the coating property of a coating liquid, physical properties of a coating film and suitability to long-term running by using a compound substituted for a conventional fluorochemical surfactant in a photosensitive lithographic printing plate material.;SOLUTION: The photosensitive lithographic printing plate material has a constituent layer containing a fluorine compound on a support, wherein the constituent layer contains as the fluorine compound a fluorine compound represented by the general formula A: Y-(CF2)n-CF3 or the general formula B: Z-(CF2)n-Y.;COPYRIGHT: (C)2007,JPO&INPIT
机译:解决的问题:提供一种光敏平版印刷版材,该材料通过在光敏平版印刷中使用代替常规含氟表面活性剂的化合物来改善涂布液的涂布性能,涂膜的物理性能以及适合于长期运行。解决方案:光敏平版印刷版材料在支撑体上具有包含氟化合物的构成层,其中该构成层包含由通式A表示的氟化合物作为氟化合物:Y-(CF 2 n -CF 3 或通式B:Z-(CF 2 n -Y .;版权:(C)2007,JPO&INPIT

著录项

  • 公开/公告号JP2007047377A

    专利类型

  • 公开/公告日2007-02-22

    原文格式PDF

  • 申请/专利权人 KONICA MINOLTA MEDICAL & GRAPHIC INC;

    申请/专利号JP20050230692

  • 发明设计人 GOTO SEI;

    申请日2005-08-09

  • 分类号G03F7/004;G03F7/00;

  • 国家 JP

  • 入库时间 2022-08-21 21:12:30

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