Being production manner of the optical reflected Characteristic substrate which is used as production manner of the optical reflected Characteristic substrate

摘要

PROBLEM TO BE SOLVED: To provide a method of producing a reflection type liquid crystal display device and a semitransmission reflection type liquid crystal display device at a low cost without producing a moire pattern.;SOLUTION: A photosensitive material of a specified film thickness is applied to one surface of a transparent, and the photosensitive material film is exposed to light through a photomask 42 having a light-transmitting pattern consisting of a periodical structure of the unit area which has an area formed of ≤1/2 length of the longer side and shorter side of a pixel as the minimum unit of the liquid crystal display part as maximum unit, and then developed and baked at a specified temperature. Thus, recesses and projections with curved faces are formed on the photosensitive material film to roughen the surface of the transparent substrate. Then a light-reflecting layer is formed on the rough surface. The photomask 42 can be used for any kind of liquid crystal display devices without producing a moire pattern as far as the liquid crystal display part has pixels having the length of the longer and shorter sides twice or larger than those of the periodical structure of the mask.;COPYRIGHT: (C)2001,JPO