The polysiloxane resin acid resisting coating composition which has high wet etching speed

摘要

Herein we disclose a composition, comprising a siloxane resin having the formula (HSiOSUB3/2/SUB)SUBa/SUB. (SiOSUB4/2/SUB)SUBb/SUB(HSiXSUB3/2/SUB)SUBc/SUB(SiXSUB4/2/SUB)SUBd/SUB, wherein each X is independently -O-, -OH, or -O-(CHSUB2/SUB)SUBm/SUB-ZSUBn/SUB, wherein each m is independently an integer from 1 to about 5, Z is an 5 aromatic moiety, and each n is independently an integer from 1 to about 6; 0a1, 0b1, 0c1, 0d1, and a+b+c+d=1. We also disclose methods for preparing the siloxane resin composition and a method of preparing an anti-reflective coating on a substrate, wherein the anti-reflective coating is derived from the siloxane resin composition.