Etching resist photosensitive resin composition, a pattern manufacturing method, MEMS structure and a manufacturing method thereof, a dry etching method, wet etching method, MEMS shutter device, and image display device

摘要

PPROBLEM TO BE SOLVED: To provide a photosensitive resin composition for an etching resist capable of forming a rectangular profile or a profile close to a rectangle even after a formed pattern is baked. PSOLUTION: A photosensitive resin composition for an etching resist contains (component A) a polymer having a monomer unit (a1) having a residue in which a carboxy group or a phenolic hydroxyl group is protected by an acid-decomposable group and a monomer unit (a2) having an epoxy group and/or an oxetanyl group, (component B) an optical acid-generating agent, and (component C) a solvent. PCOPYRIGHT: (C)2012,JPO&INPIT