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Acid-free cleaning process for substrates, in particular masks and mask blanks
Acid-free cleaning process for substrates, in particular masks and mask blanks
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机译:基材(尤其是面膜和面膜毛坯)的无酸清洁工艺
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摘要
The present invention relates to a novel and advantageous process for cleaning substrates, in particular masks and mask blanks. The process according to the invention is characterized by consecutive process steps comprising UV-treatment, fulljet cleaning, megasonic cleaning and DI (deionized) water cleaning. The process does not include an acid cleaning step.
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