Photomask plasma etching apparatus, etching method, and photomask forming method
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机译:光掩模等离子体蚀刻设备,蚀刻方法和光掩模形成方法
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摘要
A photomask plasma etching apparatus includes an electrode to generate plasma, and an electrical capacity control unit configured to control an electrical capacity between the electrode and a mask substrate to be held on the electrode.
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