首页> 外国专利> SEMICONDUCTOR DEVICE HAVING LOW RESISTANCE CONTACT TO P-TYPE SEMICONDUCTOR LAYER OF A WIDE BAND GAP COMPOUND AND METHOD FOR MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE HAVING LOW RESISTANCE CONTACT TO P-TYPE SEMICONDUCTOR LAYER OF A WIDE BAND GAP COMPOUND AND METHOD FOR MANUFACTURING THE SAME

机译:与宽带隙化合物的P型半导体层具有低电阻接触的半导体器件及其制造方法

摘要

A semiconductor device having low resistance contact to p-type semiconductor layer of a wide band gap compound and a method for manufacturing the same are provided. The semiconductor device includes a p-type semiconductor layer of a GaN based compound formed on a substrate, a p-type carbon nanotube layer, and a metal contact. The p-type carbon nanotube layer is joined to the p-type semiconductor layer of the GaN based compound, and the metal contact is joined to the p-type carbon nanotube layer.
机译:提供了一种与宽带隙化合物的p型半导体层具有低电阻接触的半导体器件及其制造方法。该半导体器件包括在基板上形成的基于GaN的化合物的p型半导体层,p型碳纳米管层和金属触点。将p型碳纳米管层接合至GaN基化合物的p型半导体层,并且将金属触点接合至p型碳纳米管层。

著录项

  • 公开/公告号US2007030871A1

    专利类型

  • 公开/公告日2007-02-08

    原文格式PDF

  • 申请/专利权人 KYU-PIL LEE;

    申请/专利号US20060425616

  • 发明设计人 KYU-PIL LEE;

    申请日2006-06-21

  • 分类号H01S5/00;

  • 国家 US

  • 入库时间 2022-08-21 21:02:03

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