首页>
外国专利>
Processes for treating morphologically-modified silicon electrode surfaces using gas-phase interhalogens
Processes for treating morphologically-modified silicon electrode surfaces using gas-phase interhalogens
展开▼
机译:使用气相卤素间化合物处理形态改性的硅电极表面的方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
Processes for treating a morphologically-modified surface of a silicon upper electrode of a plasma processing chamber include exposing the surface to a gas composition containing at least one gas-phase halogen fluoride. The gas composition is effective to remove silicon from the morphologically-modified surface and restore the surface state.
展开▼