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Magnetic sputtering targets manufactured by using controlled solidification
Magnetic sputtering targets manufactured by using controlled solidification
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机译:通过控制凝固制造的磁性溅射靶
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摘要
The sputter target of a metal cobalt-based alloy has a single substantially homogenous microstructural zone across the substantially entire thickness. Dendrites decomposition at the surface are oriented in substantially one direction and dendrites in Central rovinekovové alloys are oriented substantially in the one direction. The sputter target is formed by directional solidification under conditions of approximately the equilibrium melting removing metal alloy.
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