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Magnetic sputtering targets manufactured by using controlled solidification

机译:通过控制凝固制造的磁性溅射靶

摘要

The sputter target of a metal cobalt-based alloy has a single substantially homogenous microstructural zone across the substantially entire thickness. Dendrites decomposition at the surface are oriented in substantially one direction and dendrites in Central rovinekovové alloys are oriented substantially in the one direction. The sputter target is formed by directional solidification under conditions of approximately the equilibrium melting removing metal alloy.
机译:金属钴基合​​金的溅射靶在基本整个厚度上具有单个基本均匀的微观结构区域。表面上的枝晶分解基本上沿一个方向取向,而中心罗维科夫合金中的树枝状晶体基本上沿一个方向取向。溅射靶通过在大约平衡熔融去除金属合金的条件下定向凝固而形成。

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