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A very large perpendicular magnetic anisotropy in Pt/Co/MgO trilayers fabricated by controlling the MgO sputtering power and its thickness

机译:通过控制MgO溅射功率及其厚度制造的Pt / Co / MgO三层中非常大的垂直磁各向异性

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摘要

The perpendicular magnetic anisotropy (PMA) properties of Pt/Co/MgO trilayers are investigated as a function of the MgO sputtering power (PMgO) and its thickness (tMgO), both of which are important parameters affecting the degree of oxygen interpenetration into Co during sputtering. A strong PMA is achieved at small values of PMgO and tMgO, where the oxygen interpenetration into Co is expected to be small. The range of oxygen interpenetration is relatively extended in such a way that it affects both the Pt/Co and Co/MgO interfaces. The PMA properties of as-deposited samples are improved by post-annealing for temperatures up to 400 °C examined in this study, probably due to the diffusion of the interpenetrated oxygen atoms toward the Co/MgO interface. In a structure of Pt/Co (0.6 nm)/MgO (2 nm), which is fabricated at PMgO = 50 W and then annealed at 400 °C, a huge saturation field is achieved (over 40 kOe) indicating a very strong PMA. Between the two interfaces of Pt/Co and Co/MgO, the PMA is mainly due to the former in the as-deposited state, but the contribution of the latter increases with the increase in the annealing temperature.
机译:研究了Pt / Co / MgO三层的垂直磁各向异性(PMA)特性与MgO溅射功率(PMgO)及其厚度(tMgO)的关系,这两个参数都是影响氧在过程中渗透到Co中的程度的重要参数溅射。当PMgO和tMgO的值较小时,可以实现强大的PMA,其中氧互渗到Co中的可能性很小。氧互穿的范围以影响Pt / Co和Co / MgO界面的方式相对扩展。在本研究中,通过对高达400 C的温度进行后退火,可以改善沉积态样品的PMA特性,这可能是由于互穿的氧原子向Co / MgO界面扩散所致。在PMgO = 50 W下制造,然后在400 C退火的Pt / Co(0.6 nm)/ MgO(2 nm)结构中,获得了巨大的饱和场(超过40 kOe),表明PMA非常强。在Pt / Co和Co / MgO的两个界面之间,PMA主要是由于前者处于沉积状态,但是后者的贡献随着退火温度的升高而增加。

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