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Alloy target for PVD-process, method for producing said alloy target and PVD-proces using said alloy target
Alloy target for PVD-process, method for producing said alloy target and PVD-proces using said alloy target
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机译:用于PVD工艺的合金靶,用于制造所述合金靶的方法以及使用所述合金靶的PVD过程
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摘要
An alloyed body (I) for use as target in a physical vapor deposition (PVD) process, containing metallic and non-metallic materials, is of a composite material consisting of (a) at least one not purely metallic material, containing at least one reactive element or metalloid, embedded in (b) a metallic alloy or pure metal. Independent claims are included for: (1) the preparation of (I), using casting, melt metallurgical, pressing, die casting, powder metallurgical, sintering, explosive compression, application welding and/or laser alloying methods; (2) a PVD process using (I), in which (I) is converted into gas by light arc evaporation, hollow cathode evaporation, low voltage arc evaporation and/or sputtering methods and a hard material is deposited onto a component while obtaining an ionic plasma; and (3) components coated using the PVD process.
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