首页> 外国专利> Alloy target for PVD-process, method for producing said alloy target and PVD-proces using said alloy target

Alloy target for PVD-process, method for producing said alloy target and PVD-proces using said alloy target

机译:用于PVD工艺的合金靶,用于制造所述合金靶的方法以及使用所述合金靶的PVD过程

摘要

An alloyed body (I) for use as target in a physical vapor deposition (PVD) process, containing metallic and non-metallic materials, is of a composite material consisting of (a) at least one not purely metallic material, containing at least one reactive element or metalloid, embedded in (b) a metallic alloy or pure metal. Independent claims are included for: (1) the preparation of (I), using casting, melt metallurgical, pressing, die casting, powder metallurgical, sintering, explosive compression, application welding and/or laser alloying methods; (2) a PVD process using (I), in which (I) is converted into gas by light arc evaporation, hollow cathode evaporation, low voltage arc evaporation and/or sputtering methods and a hard material is deposited onto a component while obtaining an ionic plasma; and (3) components coated using the PVD process.
机译:包含金属和非金属材料的用作物理气相沉积(PVD)工艺中靶材的合金体(I)是由(a)至少一种非纯金属材料组成的复合材料,其中至少包含一种(b)嵌入金属合金或纯金属中的反应性元素或准金属。独立权利要求包括:(1)使用铸造,熔融冶金,压制,压铸,粉末冶金,烧结,爆炸压缩,应用焊接和/或激光合金化方法制备(I); (2)使用(I)的PVD工艺,其中(I)通过电弧电弧蒸发,空心阴极蒸发,低压电弧蒸发和/或溅射方法转化为气体,并在获得质量分数的同时将硬质材料沉积到部件上离子等离子体(3)使用PVD工艺涂覆的组件。

著录项

  • 公开/公告号EP1722003A1

    专利类型

  • 公开/公告日2006-11-15

    原文格式PDF

  • 申请/专利权人 FETTE GMBH;

    申请/专利号EP20060006000

  • 发明设计人 KOELKER WERNER DR.;

    申请日2006-03-23

  • 分类号C23C14;

  • 国家 EP

  • 入库时间 2022-08-21 20:50:58

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