In-Cu ALLOY POWDER, METHOD FOR PRODUCING In-Cu ALLOY POWDER, In-Cu ALLOY SPUTTERING TARGET, AND METHOD FOR PRODUCING In-Cu ALLOY SPUTTERING TARGET

摘要

To provide In-Cu alloy powder having a reduced oxygen content, a method for producing the same, an In-Cu alloy sputtering target in which abnormal discharge frequency upon sputtering is reduced, and a method for producing the same.SOLUTION: Provided is In-Cu alloy powder in which the content of oxygen is 1,000 mass ppm or lower. Also provided is a method for producing In-Cu alloy powder comprising: a vacuum drawing step where a heat-resistant container charged with raw material metals including In and Cu is made into a vacuum degree of 10 Pa or lower; a melting step where an inert gas with an oxygen concentration of 50 volume ppm or lower is introduced into the heat resistant container to fill the inside of the heat resistant container with the inert gas, and, thereafter, it is heated to 1,100°C or higher to melt the raw metals so as to be melted raw material; and an atomizing step where the melted raw material at a temperature of 700°C or higher is atomized with an inert gas with an oxygen concentration of 50 volume ppm or lower. Also provided is an In-Cu alloy sputtering target being a sintered compact with an oxygen content of 1,000 mass ppm, and also provided is a method for producing the same where the raw material powder including In-Cu alloy powder is sintered.SELECTED DRAWING: None