首页> 外国专利> METHOD OF MAKING UNDOPED, ALLOYED AND DOPED CHALCOGENIDE FILMS BY MOCVD PROCESSES

METHOD OF MAKING UNDOPED, ALLOYED AND DOPED CHALCOGENIDE FILMS BY MOCVD PROCESSES

机译:通过MOCVD工艺制备未掺杂,合金化和掺杂的硫族化物薄膜的方法

摘要

A method of making Undoped, Alloyed and Doped Chalcogenide Films by CVD and particularly a film of GeSbTe which is a phase change material. These films are useful in electronic memory devices and other applications. In the method gas or vapor phase precursors of the elements are transported to a reaction chamber where they are deposited on a heated substrate under controlled conditions.
机译:一种通过CVD制造未掺杂,合金化和掺杂的硫族化物膜的方法,尤其是一种GeSbTe膜,它是一种相变材料。这些薄膜可用于电子存储设备和其他应用中。在该方法中,元素的气相或气相前体被输送到反应室,在受控条件下将它们沉积在加热的基材上。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号