LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, DEVICE MANUFACTURED THEREBY, AND CONTROLLABLE PATTERNING DEVICE UTILIZING A SPATIAL LIGHT MODULATOR WITH DISTRIBUTED DIGITAL TO ANALOG CONVERSION

摘要

A lithographic apparatus, a device manufacturing method, a device manufactured thereby, and a controllable patterning device utilizing a spatial light modulator with distributed digital to analog conversion are provided to form a pattern on a substrate by using the controllable patterning device. An illumination system(IL) supplies a beam of radiation. A controllable patterning device includes an array of individually controllable elements for patterning the beam. A control system(CR) outputs a voltage signal and controls the patterning device. A projection system projects the patterned beam onto a target part of a substrate(W). A supply channel is coupled to the patterning device. The patterning device includes a plurality of cells. Each cell includes the individually controllable element, a local control circuit for generating a control voltage to determine a configuration of the controllable element. The supply channel applies the voltage signal to each cell. The control system supplies control signals to the local control circuits. Each of the local control circuits includes a first controllable switching device and a plurality of electronic components. Each of the local control circuits generates the control voltage from the voltage signal in response to the control signal.