首页> 外国专利> CONDUCTIVE BASE MATERIAL WITH THIN FILM RESISTANCE LAYER, METHOD OF PRODUCTION OF CONDUCTIVE BASE MATERIAL WITH THIN FILM RESISTANCE LAYER, AND CIRCUIT BOARD WITH THIN FILM RESISTANCE LAYER

CONDUCTIVE BASE MATERIAL WITH THIN FILM RESISTANCE LAYER, METHOD OF PRODUCTION OF CONDUCTIVE BASE MATERIAL WITH THIN FILM RESISTANCE LAYER, AND CIRCUIT BOARD WITH THIN FILM RESISTANCE LAYER

机译:具有薄膜电阻层的导电性基材,具有薄膜电阻层的导电性基材的制造方法以及具有薄膜电阻层的电路基板

摘要

A conductive base material with a thin film resistance layer, a method for manufacturing the conductive base material, and a circuit board having the thin film resistance layer are provided to reduce a variation in resistance of the thin film resistance layer by adjusting the thin film resistance layer using a thermal process. A conductive base material contains a thin film resistance layer. The thin film resistance layer is made of nickel containing phosphor. The thin film resistance layer is a thin film layer containing a mixture of crystalline and non-crystalline materials. The thin film resistance layer includes a Ni-plating layer, which contains phosphor. The Ni-plating layer is heat treated, such that both crystalline and non-crystalline materials are contained in the thin film resistance layer. The heat treatment process is performed at a temperature between 100 and 700°C.
机译:提供一种具有薄膜电阻层的导电性基材,该导电性基材的制造方法以及具有该薄膜电阻层的电路基板,以通过调整薄膜电阻来减少薄膜电阻层的电阻变化。层使用热处理。导电性基材包含薄膜电阻层。薄膜电阻层由含镍磷光体制成。薄膜电阻层是包含结晶和非晶材料的混合物的薄膜层。薄膜电阻层包括含有磷的镍镀层。对镍镀层进行热处理,使得在薄膜电阻层中同时包含晶体材料和非晶材料。热处理过程在100至700℃之间的温度下进行。

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