Off-axis projection optics and extreme ultra violet lithography apparatus applying it

摘要

, and the positional relationship between the reserve , comprising a first and a second mirror that share the focus , the object the distance from the first mirror from the side l ₁ , the angle of incidence of light incident on the first mirror side, object surface i ₁ , leading to shared focus from the first mirror a distance l ₁ '', the distance from the second mirror from the shared focus l ₂ , the angle of incidence of light incident on the second mirror side of the first mirror i ₂ , and the second when the distance from the top surface from the mirror to be referred to as l ₂ '', stockpile characterized in that the projection optical system satisfies the following formula is disclosed . ; & style &