Apparatus of automatically detecting optimum lithography process parameters and methods of automatically detecting optimum lithography process parameters using the same

摘要

optimal lithography process of the device to automatically detect the parameters and the optimal parameters of the lithography process using it a method for automatically detecting are provided. The measuring device, which are operated by a control unit, and an analog / digital converter and a processor. The meter measures the width and profile of the photoresist pattern is formed using a predetermined exposure energy and focus of the exposure given to the wafer. The analog / digital converter converts the analog values of the line width and profile measured by the meter into a digital signal. The processor judges whether or not the analog / digital converter is output from the digit localized (digitized) line width and the profile compared with the standard line width of the reference profile and the digit line width and the profile is best localized.