SELF-ALIGNED FABRICATION TECHNIQUE FOR TRI-TONE ATTENUATED PHASE-SHIFTING MASKS

摘要

Triple-tone attenuated phase-shift is provided a structure and method to ensure the production of a self-aligned mask. Phase 0 °, the rim having a resolution greater than 90% transmittance are provided along the non-transparent area. This portion having the opaque and attenuated regions of the mask-resolution alignment of the rim is carried out in a single patterning step. In one embodiment, the opaque area is a narrow portion having a larger transmittance than the 0 ° phase, 90% - can be replaced by line resolution.