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Process for the preparation of broadband antireflection film and the broadband antireflection film prepared therefrom

机译:宽带抗反射膜的制备方法以及由此制备的宽带抗反射膜

摘要

A broadband anti-reflection film manufacturing method and an anti-reflection film manufactured by the same are provided to form plural pores inside the anti-reflection film by condensing water drops. A high-molecular material is dissolved in a resolvent having a low boiling point, so that high-molecular solution is obtained. The high-molecular solution is coated on a substrate in a high-humidity atmosphere. The high-molecular material is an atypical transparent high-molecular agent. The high-molecular material is selected from a group consisting of an acryl-group polymer, a cellulose-group polymer, a styrene-group polymer, a polysulfone-group polymer, a fluor-group polymer, and mixtures thereof. The boiling point of the low-boiling point resolvent lies between 40 and 100‹C.
机译:提供宽带抗反射膜的制造方法和由其制造的抗反射膜,以通过冷凝水滴而在抗反射膜内部形成多个孔。将高分子材料溶解在低沸点的分解物中,从而得到高分子溶液。高分子溶液在高湿度气氛中被涂覆在基板上。高分子材料是非典型的透明高分子剂。高分子材料选自由丙烯酸基聚合物,纤维素基聚合物,苯乙烯基聚合物,聚砜基聚合物,氟基聚合物及其混合物组成的组。低沸点分解剂的沸点在40至100℃之间。

著录项

  • 公开/公告号KR100687728B1

    专利类型

  • 公开/公告日2007-02-27

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20050055409

  • 发明设计人 박민수;김진곤;

    申请日2005-06-25

  • 分类号G02B1/11;

  • 国家 KR

  • 入库时间 2022-08-21 20:32:49

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