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Photocurable Semiconductor Nanocrystal, Photocurable Composition for Pattern Formation of Semiconductor Nanocrystal and Method of Patterning Nanocrystal using the same
Photocurable Semiconductor Nanocrystal, Photocurable Composition for Pattern Formation of Semiconductor Nanocrystal and Method of Patterning Nanocrystal using the same
Semiconductor nanocrystals surface-coordinated with a compound containing a photosensitive functional group, a photosensitive composition comprising semiconductor nanocrystals, and a method for forming semiconductor nanocrystal pattern by producing a film using the photosensitive semiconductor nanocrystals or the photosensitive composition, exposing the film to light and developing the exposed film, are provided. The semiconductor nanocrystal pattern exhibits luminescence characteristics comparable to the semiconductor nanocrystals before patterning and can be usefully applied to organic-inorganic hybrid electroluminescent devices.
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