A method for sintering ITO using a microwave

摘要

ITO invention by microwave sintering (Indium Tin Oxide, indium tin oxide) sputtering target (sputtering target ) that relates to a process for the manufacture , improving the sintering characteristics of the conventional ITO sputtering target for producing a transparent conductive film in electrical conductivity and high density of a uniform ITO sputtering target to enhance the transmittance, and the product that occur during sintering reducing the damage by using a microwave (2.45GHz, 700W) in order to improve the productivity is to manufacture an ITO sputtering target with no inner defect less sintering deviation .