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ANTIREFLECTION BASE FOR ULTRAVIOLET AND VACUUM ULTRAVIOLET REGIONS
ANTIREFLECTION BASE FOR ULTRAVIOLET AND VACUUM ULTRAVIOLET REGIONS
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机译:紫外线和真空紫外线区域的抗弯基础
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摘要
An antireflection substrate comprising a substrate which is transparent to ultraviolet and vacuum ultraviolet rays in the wavelength region from 155 nm to 200 nm and a mono-, bi- or tri-layer antireflection film formed on at least one side of the substrate, wherein the refractive index and the physical thickness of the antireflection film at the center wavelength lambda 0 of the wavelength region of ultraviolet or vacuum ultraviolet light which needs antireflection satisfy particular conditions, and an optical component for a semiconductor manufacturing apparatus and a substrate for a low-reflection pellicle which is the ultraviolet and vacuum ultraviolet antireflection substrate. IMAGE
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