Plasma enhanced chemical vapor deposition equipment for the fabrication of organic light emission diode and liquid crystal display panel

摘要

The present invention relates to a Plasma Enhanced Chemical Vapor Deposition Apparatus, and more particularly, includes a plurality of process chambers, a load-lock chamber, and a heating chamber. And a clustered plasma chemical vapor deposition apparatus including a transfer chamber for transferring substrates between the chambers, and improving productivity of the clustered plasma chemical vapor deposition apparatus, that is, processing time per hour ( Designed to improve throughput, minimize fab footprint, reduce process gas (SiH4, NH3, H2, N2, PH3, etc.), and reduce power consumption Technology. The present invention is to change the structure and configuration of the plasma chemical vapor deposition apparatus that processed the conventional glass substrate in a single unit in order to achieve the above-mentioned technical problem, so that the glass substrate can be processed in two units (Dual ) Clustered plasma chemical vapor deposition apparatus of glass substrate processing method is implemented, and related general technology is provided.;Plasma Chemical Vapor Deposition Chamber, Cluster, Load Lock Chamber, Transfer Chamber, Vacuum Robot