Field illumination device for micro-lithography projection exposure system, has field homogenization unit and lens provided between laser and reflecting unit, which is designed so that position of optical axis is not changed by rotation

摘要

The device has a light beam that is transformed by a refractive lens (5), where a rotatably supported reflecting unit (6) is arranged between the laser and a pupil plane (7) of illumination. The unit is rotated around an optical axis (17) of the beam and is designed in such a manner that the position of the axis is not changed by rotation. A field homogenization unit (10) and the lens are provided between the laser and the reflecting unit. A laser (1) transmits a raw beam (2) that is separated into a light beam (3).