Projection lens for microlithographic projection exposure system, has two optical units that are so designed that they are not rotationally symmetric to optical axis, where each unit generates one respective distribution of time delay

摘要

The lens has an optical unit (110), which generates a distribution of time delay in a plane, which is perpendicular to an optical axis (OA). Another optical unit (120) generates another distribution of time delay in a plane, which is perpendicular to an optical axis (OA). The two optical units are designed in such a manner that they are not rotationally symmetric to the optical axis, respectively. The latter distribution of time delay partially compensates the former distribution of time delay. The optical units are made from cubical crystalline material, which is composed of sapphire, lime, potassium oxide, silicon oxide and sodium. Independent claims are also included for the following: (1) a microlithographic projection exposure system with a projection lens (2) a method for microlithographic manufacturing of a micro-structured component (3) a micro-structured component.