Interferometric determination apparatus e.g. for measuring layer thickness of partly transparent layers on substrates, has scanner which automatically scans layers in vertical direction

摘要

The apparatus has a scanning device which automatically scans the layers in the vertical direction (Z) and which an interference plane (IE) can be moved relative to a layer structure. An interferometer part (IT) is provided with a white light interferometer (WLI) and or a wavelength scanning interferometer (WLSI). An independent claim is included for a method for interferometric measuring of layer thicknesses of part-transparent layers on substrates.