Arrangement for the suppression of undesired spectral components in the case of a plasma were based euv - radiation source

摘要

The invention relates to an arrangement for the suppression of undesired spectral components (a so-called ''out - of - band ′ - radiation) in the case of a plasma source based.The object, a new possibility for the suppression of undesired spectral components in from a plasma were based euv - radiation source of radiation exiting the invention to find a simple suppression of ''out - of - band ′ - radiation outside of the desired euv - area without complicated and expensive manufacture and allows adjustment of the diffraction gratings, is solved according to the invention, in that between the plasma and the site of application of the euv - radiation, a filter unit with at least one gas curtain consists of at least a rapidly flowing gas, the molecules for the desired euv - radiation emitted no, and for other undesired wavelengths, but at least in the ir - region, intensive absorption maxima, is present, for the generation of the gas curtain at least one aperture nozzle, and an efficient gas-cutting laterally with respect to each other an optical axis of the bundle of rays are arranged opposite one another, in order to limit the gas curtain spatially defined and as completely as possible to remove again from the vacuum chamber.