首页> 外国专利> IMPROVED REVERSE HYDROGENATION TECHNIQUE FOR ERROR PASSIVATION IN SILICON SOLAR CELLS.

IMPROVED REVERSE HYDROGENATION TECHNIQUE FOR ERROR PASSIVATION IN SILICON SOLAR CELLS.

机译:改进的反向加氢技术,可钝化硅太阳能电池中的错误。

摘要

A two-step back-side hydrogenation process includes the steps of first bombarding the back side of the silicon substrate with hydrogen ions with intensities and for a time sufficient to implant enough hydrogen atoms into the silicon substrate to potentially passivate substantially all of the defects and impurities in the silicon substrate, and then illuminating the silicon substrate with electromagnetic radiation to activate the implanted hydrogen, so that it can passivate the defects and impurities in the substrate. The illumination step also annihilates the hydrogen-induced defects. The illumination step is carried out according to a two-stage illumination schedule, the first or low-power stage of which subjects the substrate to electromagnetic radiation that has sufficient intensity to activate the implanted hydrogen, yet not drive the hydrogen from the substrate. The second or high-power illumination stage subjects the substrate to higher intensity electromagnetic radiation, which is sufficient to annihilate the hydrogen-induced defects and sinter/alloy the metal contacts.
机译:分两步的背面氢化工艺包括以下步骤:首先用一定强度的氢离子轰击硅衬底的背面,并持续足够长的时间,以将足够的氢原子注入到硅衬底中,从而潜在地钝化基本上所有的缺陷。硅衬底中的杂质,然后用​​电磁辐射照射硅衬底以激活注入的氢,这样它就可以钝化衬底中的缺陷和杂质。照射步骤还消除了由氢引起的缺陷。照明步骤是根据两阶段的照明计划执行的,该计划的第一阶段或低功率阶段将使基板经受电磁辐射,该电磁辐射的强度足以激活注入的氢,但不会将氢驱离基板。第二或大功率照明阶段使衬底经受较高强度的电磁辐射,这足以消除氢引起的缺陷并烧结/合金化金属触点。

著录项

  • 公开/公告号DE69334075T2

    专利类型

  • 公开/公告日2007-05-31

    原文格式PDF

  • 申请/专利权人 MIDWEST RESEARCH INSTITUTE;

    申请/专利号DE19936034075T

  • 发明设计人

    申请日1993-08-24

  • 分类号H01L21/26;H01L31/18;

  • 国家 DE

  • 入库时间 2022-08-21 20:27:31

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