ILLUMINANCE EQUALIZING SYSTEM, EXPOSURE APPARATUS, EXPOSURE METHOD, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an illuminance equalizing optical system which eliminates impurity efficiently.;SOLUTION: The illuminance equalizing optical systems (351a, 351b) include a plurality of optical elements (3511a, 3511b), and emit light onto the optical elements (3511a, 3511b) and condense light therefrom to offer equalized illuminance. Adsorption elements (1011) adsorbing an impurity are arranged between the optical elements (3511a, 3511b).;COPYRIGHT: (C)2008,JPO&INPIT