CLEANING SOLUTION COMPOUNDING DEVICE AND CLEANING SOLUTION SUPPLY METHOD IN CMP APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a cleaning solution compounding device and a cleaning solution supply method in a CMP (chemical-mechanical polishing) apparatus for stabilizing the concentration and flow rate of a cleaning solution supplied to a cleaner.;SOLUTION: In a cleaning solution compounding apparatus for compounding a cleaning solution and supplying the solution to a cleaner 3 in a CMP apparatus 1, chemical lines having two chemical storage tanks 10, 11 and flow control valves 40 to 42 provided therein are connected to the cleaner 3, and three-way switching valves 33 to 35 are provided at locations immediately preceding the cleaner 3 in the chemical lines. Pure water line having flow control valves 56 to 58 are connected to the 3-way switching valves 33 to 35 in the chemical lines. When chemicals and pure waters are combined/mixed at the three-way switching valves 33 to 35, the cleaning solution is compounded in the lines. Chemicals in the chemical storage tanks 10, 11 are forcedly supplied under influence of an inactive gas having a predetermined pressure.;COPYRIGHT: (C)2008,JPO&INPIT