COMPOSITION FOR FORMING SILICON-CONTAINING FILM, SILICON-CONTAINING FILM, SUBSTRATE WITH SILICON-CONTAINING FILM FORMED THEREON, AND PATTERN FORMING METHOD USING THE SAME

摘要

PPROBLEM TO BE SOLVED: To provide a composition for forming a silicon-containing film enabling good patterning of a photoresist film to be formed on a silicon-containing intermediate film which is formed by using the composition. PSOLUTION: The composition for forming a thermosetting silicon-containing film comprises (A-1) a silicon-containing compound prepared by effecting hydrolytic condensation of a hydrolyzable silicon compound using an acid catalyst and removing the acid catalyst from the obtained reaction mixture, (A-2) a silicon-containing compound obtained by effecting hydrolytic condensation of a hydrolyzable silicon compound using a basic catalyst and removing the basic catalyst from the obtained reaction mixture, (B) a compound expressed by formula (1): LSBa/SBHSBb/SBX (L is Li, Na, K, Rb or Cs; X is OH or an organic acid group; a is ≥1, b is 0 or ≥1, a+b is the number of hydroxy groups or organic acid groups) or formula (2): MA (M is sulfonium, iodonium or ammonium; A is a non-nucleophilic counter ion), (C) a 1-30C organic acid and (D) an organic solvent. PCOPYRIGHT: (C)2008,JPO&INPIT