Sensitivity calibration method of optical inspection apparatus using the calibration standard sample of optical inspection equipment for

摘要

PROBLEM TO BE SOLVED: To inspect a fault on a transparent interlayer insulating film of a surface of a semiconductor wafer with satisfactory sensitivity by arranging a predetermined number of simulated faults of a cubic shape specified in its three-dimensional size by a processing parameter on a surface of a sample and inspecting it by a standard optically inspecting apparatus, thereby actually measuring the sensitivity of the fault. ;SOLUTION: A fault detecting simulator 110 predicts a detection output based on a shape designing data 102 of a simulated fault to obtain a simulated result 106. A simulated fault processing means 111 processes and forms a simulated fault 105 of a cubic shape conforming to the data 102 based on a processing parameter 104 set based on the data 102 of the simulated fault on a surface of a sample. The processed fault 105 is shape-measured by a shape measuring means 112. Actually measured shape data 108 of the measured fault is compared with the data 102 by a comparing means 1001. If a size difference exceeds an allowable range, the parameter 104 is corrected, and the defect 105 is again processed.;COPYRIGHT: (C)1998,JPO