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Single crystal aluminum nitride film and a method of forming the same, III-nitride film for the underlying substrate, a light emitting element and surface acoustic wave device,

机译:单晶氮化铝膜及其形成方法,用于下层基板,发光元件和声表面波器件,

摘要

PROBLEM TO BE SOLVED: To provide a single crystal aluminum nitride membrane for use in an underlying substrate for the group III nitiride membrane, a luminescence element as well as a surface elastic wave devise, of which the transition density is small, the lattice inconsistencies are small and the crystallinity is excellent and that is capable of forming the group III nitride membrane with excellent luminous efficacy on the membrane.;SOLUTION: The single crystal aluminum nitride laminated substrate is provided by laminating the single crystal aluminum membrane to the most outer layer via an acid aluminum layer on a single crystal α-Al2O3 substrate such as a sapphire substrate, wherein the transition density of the single aluminum nitride is 108/cm2. The single crystal aluminum nitride membrane as well as the single crystal aluminum laminated substrate are formed by nitriding the substrate through conducting the heat treatment in the presence of nitrogen and carbon monoxide.;COPYRIGHT: (C)2004,JPO
机译:解决的问题:为了提供用于III族氮化物膜的下层基底的单晶氮化铝膜,发光元件以及表面弹性波装置,其转变密度小,晶格不一致是小且结晶度极佳,能够在膜上形成具有出色发光效率的III族氮化物膜。;解决方案:通过将单晶铝膜层压至最外层,从而形成单晶氮化铝叠层基板单晶-α-Al 2 O 3 衬底(例如蓝宝石衬底)上的酸性铝层,其中单个氮化铝的跃迁密度为10 8 / cm 2 。通过在氮和一氧化碳的存在下进行热处理来氮化衬底,从而形成单晶氮化铝膜以及单晶铝层压衬底。COPYRIGHT:(C)2004,JPO

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