Being the manner which forms the patterning thin film in patterning thin film formation

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a patterned thin film and a method for manufacturing a micro device which reliably removes a resist mask without causing so-called "burrs".;SOLUTION: The patterned thin film 107 is formed on a substrate 101 by using the resist mask 110. Subsequently, organic resin layers 108, 109 which cover the resist mask 110 and the patterned thin film 107 are formed. Then, a heating treatment is performed and, thereafter, the organic resin layers 108, 109 and the resist mask 110 are removed.;COPYRIGHT: (C)2004,JPO