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The positron beam generation source which discharges the positron re-discharge microscope and

机译:使正电子再放电显微镜放电的正电子束产生源和

摘要

PROBLEM TO BE SOLVED: To observe a material of a positive work function to positrons by holding a sample at the incident location of a positron beam, generating an electric field in a pace close to the sample, and accelerating and observing positrons reemitted from the sample. ;SOLUTION: A sample 10 of a positive work function to positrons held at a sample holding base 3 is irradiated with a positron beam 2 emitted from a positron beam source 1, and an electron lens 5 and screen 7 are arranged on the downstream side of the sample 10. The sample 10 is brought into a high potential side by a high voltage power source 8 to generate an electric field toward the screen 7. Then when the electric field is strengthened, an apparent work function is reduced and a distance is shortened. A potential barrier in the vicinity of the surfaces of the sample 10 is lowered and thinned when viewed from the positrons, and positrons 4 inside the sample 10 are reemitted by the tunnel effect when the potential barrier is thinned. As a beam of the reemitted positrons 4 is enlarged and projected onto the screen 7 by the electron lens 5, it becomes possible to obtain information on impurities, etc., in the surfaces from the projected images.;COPYRIGHT: (C)2001,JPO
机译:解决的问题:通过将样品保持在正电子束的入射位置,以接近样品的速度产生电场,并加速和观察从样品中释放出的正电子,观察对正电子具有正功函数的材料。 ;解决方案:用正电子束源1发射的正电子束2照射对固定在样品保持座3上的正电子具有正功函数的样品10,并在电子束5的下游安装电子透镜5和屏幕7。样品10被高压电源8带到高电位侧,以朝屏幕7产生电场。然后,当电场增强时,表观功函数减小,距离缩短。 。当从正电子观看时,样品10的表面附近的势垒降低和变薄,并且当使势垒变薄时,通过隧道效应使样品10内部的正电子4重新释放。当再发射的正电子4的束被电子透镜5放大并投射到屏幕7上时,就可以从投射的图像中获取表面中的杂质等信息。;版权:(C)2001,日本特许厅

著录项

  • 公开/公告号JP4109397B2

    专利类型

  • 公开/公告日2008-07-02

    原文格式PDF

  • 申请/专利权人 住友重機械工業株式会社;

    申请/专利号JP19990232539

  • 发明设计人 廣瀬 雅文;

    申请日1999-08-19

  • 分类号G01N23/225;G01N23/04;G21H5/00;G21K5/04;H01J37/26;H01J37/27;

  • 国家 JP

  • 入库时间 2022-08-21 20:19:10

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