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The occasion where the thin film semiconductor formation which consists of

机译:构成薄膜半导体的场合

摘要

PROBLEM TO BE SOLVED: To effectively prevent variations in sheet resistance values, which occur when a thin film semiconductor layer is formed by epitaxial growth on a compound semiconductor single crystal substrate having a substrate off angle.;SOLUTION: When the thin film semiconductor layer is epitaxially grown on the compound semiconductor single crystal substrate, the compound semiconductor single crystal substrate which has such accuracy of the substrate off angle that variations in entrapped impurity concentrations fall within prescribed acceptable values is used, and thus the sheet resistance values fall within a prescribed range.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:为了有效地防止当在具有衬底偏角的化合物半导体单晶衬底上通过外延生长形成薄膜半导体层时发生的薄层电阻值变化。外延生长在化合物半导体单晶衬底上的化合物半导体单晶衬底具有衬底偏角的精度,使得所夹杂的杂质浓度的变化落入规定的可接受值内,因此薄层电阻值落入规定的范围内。;版权:(C)2003,日本特许厅

著录项

  • 公开/公告号JP4112207B2

    专利类型

  • 公开/公告日2008-07-02

    原文格式PDF

  • 申请/专利权人 住友化学株式会社;

    申请/专利号JP20010327443

  • 发明设计人 山田 永;小廣 健司;

    申请日2001-10-25

  • 分类号H01L21/205;C30B25/18;C30B29/42;

  • 国家 JP

  • 入库时间 2022-08-21 20:18:36

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